Method of producing an interposer-chip-arrangement for dense packaging of chips

ABSTRACT

The method of producing an interposer-chip-arrangement, comprises providing an interposer ( 1 ) with an integrated circuit ( 25 ), arranging a dielectric layer ( 2 ) with metal layers embedded in the dielectric layer above a main surface ( 10 ) of the interposer, connecting the integrated circuit with at least one of the metal layers, forming an interconnection ( 7 ) through the interposer, the interconnection contacting one of the metal layers, arranging a further dielectric layer ( 3 ) above a further main surface ( 11 ) of the interposer opposite the main surface and arranging a further metal layer in or on the further dielectric layer, the further metal layer being connected with the interconnection, arranging a chip provided with at least one contact pad at the main surface or at the further main surface, and electrically conductively connecting the contact pad with the interconnection.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a divisional application of U.S. patent application Ser. No. 14/561,164 entitled “INTERPOSER-CHIP-ARRANGEMENT FOR DENSE PACKAGING OF CHIPS,” filed on Dec. 4, 2014, which claims the benefit of priority from Provisional Patent Application No. 61/912,114, filed on Dec. 5, 2013, and claims the benefit of priority of European Patent Office Patent Application 13198854.5 filed on Dec. 20, 2013, all of which are hereby incorporated by reference in their entirety for all purposes.

BACKGROUND OF THE INVENTION 1. Field of the Invention

The invention relates to an arrangement of a semiconductor chip and an interposer for dense packages in semiconductor technology.

2. Description of Related Art

Dense packaging of semiconductor chips is achieved by techniques that allow a compact arrangement of chips in a housing, like wafer-to-wafer or chip-to-wafer direct bonding. Through-silicon vias (TSVs), which are also called through-substrate vias in more general applications, and advanced wiring methods can also be used to reduce the dimensions.

US 2011/0024916 A1 discloses a method of forming an interposer package with through-silicon vias. A semiconductor die and a dummy die provided with a through-silicon via are mounted over a carrier, the dies are encapsulated, and the carrier is removed. A first redistribution layer is formed over the dies, thus electrically connecting the through-silicon via and a contact pad of the semiconductor die. An insulation layer is formed over the first redistribution layer. A second redistribution layer is formed opposite the first redistribution layer and electrically connected to the through-silicon via. A semiconductor package is connected to the second redistribution layer.

M. Murugesan et al., “High-step-coverage Cu-lateral interconnections over 100 μm thick chips on a polymer substrate—an alternative method to wire bonding,” in J. Micromech. Microeng. 22 (2012) 085033 doi:10.1088/0960-1317/22/8/085033, describe a method for packaging different kinds of chips on a wafer level. The resistance value of high-step-coverage interconnections formed by electroplating over 100 μm thick silicon chips was found to be very close to the resistance value of interconnections on the plain wafer even at 150° C. The method is suggested for the manufacture of CMOS compatible interconnections between a polymer substrate and a chip.

Qianwen Chen et al., “Chip-to-Wafer (C2 W) 3D Integration with Well-Controlled Template Alignment and Wafer-Level Bonding,” in IEEE 61st Electronic Components and Technology Conference (ECTC 2011), describe the embedding of chips into cavities.

Akitsu Shigetou and Tadatomo Suga, “Homo/Heterogeneous Bonding of Cu, SiO₂, and Polyimide by Low Temperature Vapor-Assisted Surface Activation Method,” in IEEE 61st Electronic Components and Technology Conference (ECTC 2011), describe polyimide bonding with thickness of 10 nm.

SUMMARY OF THE INVENTION

The method of producing an interposer-chip-arrangement comprises providing an interposer with an integrated circuit, arranging a dielectric layer with metal layers embedded in the dielectric layer above a main surface of the interposer, connecting the integrated circuit with at least one of the metal layers, forming an interconnection through the interposer, the interconnection contacting one of the metal layers, arranging a further dielectric layer above a further main surface of the interposer opposite the main surface with a further metal layer arranged in or on the further dielectric layer, the further metal layer being connected with the interconnection, arranging a chip provided with at least one contact pad at the main surface or at the further main surface, and electrically conductively connecting the contact pad with the interconnection.

In a variant of the method, a structured metallization is applied to connect the contact pad with the interconnection.

In further variants of the method, the contact pad is connected with the interconnection via one of the metal layers or via the further metal layer.

In a further variant of the method, a cavity is formed in the interposer, and the chip is arranged in the cavity.

In a further variant of the method, a further cavity is formed in the interposer, and a further chip provided with at least one contact pad is arranged in the further cavity, so that the contact pads of the chips are at the same level.

In a further variant of the method, the interconnection is formed in the shape of a hollow cylinder and is filled with dielectric material.

The following is a detailed description of examples of the method and of intermediate products of examples of the method in conjunction with the appended figures.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross section of an embodiment of the interposer-chip-arrangement.

FIG. 2 is a cross section of an intermediate product of a method of producing the interposer-chip-arrangement.

FIG. 3 is a cross section according to FIG. 2 after the formation of through-substrate-vias.

FIG. 4 is a cross section according to FIG. 3 after the placement of chips.

FIG. 5 is a cross section according to FIG. 4 after the application of a cover layer provided with openings.

FIG. 6 is a cross section according to FIG. 3 after the formation of chip cavities for a further embodiment.

FIG. 7 is a cross section according to FIG. 6 after the placement of chips.

FIG. 8 is a cross section according to FIG. 7 after the application of a metallization.

FIG. 9 is a cross section according to FIG. 6 for a further embodiment.

FIG. 10 is a cross section according to FIG. 9 after the placement of chips.

FIG. 11 is a cross section according to FIG. 10 after the application of a metallization.

FIG. 12 is a cross section according to FIG. 11 for a further embodiment comprising chips mounted in flip-chip technology.

DETAILED DESCRIPTION

FIG. 1 is a cross section of an embodiment of the interposer-chip-arrangement. The interposer 1, which may be semiconductor material, especially a silicon wafer, for instance, has a main surface 10 and a further main surface 11 opposite the main surface. A dielectric layer 2, which may be an oxide of the semiconductor material, for instance, is arranged above the main surface 10. Structured and interconnected metal layers 5 are embedded in the dielectric layer 2. An integrated circuit 25 is arranged in the interposer 1 and is connected with at least one of the metal layers 5, which can be provided as a wiring of the integrated circuit 25. A further dielectric layer 3 is arranged above the further main surface 11 with at least one further metal layer 6 embedded in the further dielectric layer 3.

An electrically conductive interconnection 7 through the interposer 1 connects one of the metal layers 5 and the further metal layer 6. The interconnection 7 can be formed by a metallization, which is arranged in a via hole and may be electrically insulated from the material of the interposer 1 by an insulation 8 at the sidewall of the via hole. The metallization of the interconnection 7 is applied on a contact area 9 of the relevant metal layer 5. The interconnection 7 can be formed as an open through-substrate via in the shape of a hollow cylinder surrounding an inner volume, which may be filled with dielectric material, for instance.

A chip 12 comprising at least one contact pad 15 is arranged on or above the dielectric layer 2. The contact pad 15 is electrically conductively connected with the interconnection 7 by means of a structured metallization 20, which is applied on the contact pad 15 and on a metal layer 5 that is electrically conductively connected with the interconnection 7. Instead of the structured metallization 20, bond wires may be applied to connect the contact pad 15 with the metal layer 5. A cover layer 16 may be applied on the dielectric layer 2 and on the chip 12. The cover layer 16 is provided with openings 17 above the contact pad 15 and above the metal layer 5 to enable the electrical connection.

The further metal layer 6 can be provided as a redistribution layer or as part of a further wiring, for instance. A further contact area 19 on the further metal layer 6 can be provided with a bump contact 18, which can be a solder ball, for instance. The bump contact 18 serves as an external electrical connection, in particular as a connection with conductor tracks or the like when the interposer-chip-arrangement is mounted on a carrier like a printed circuit board 21, for instance.

A method for producing the interposer-chip-arrangement is described in the following in conjunction with FIGS. 2 to 5, which show cross sections of intermediate products. Elements corresponding to similar elements of the embodiment according to FIG. 1 are designated with the same reference numerals.

FIG. 2 is a cross section of the interposer 1 with the dielectric layer 2 and embedded metal layers 5 on its main surface 10. An integrated circuit 25 is connected to the metal layers 5, which serve as a wiring. Manufacture is facilitated if a handling wafer 4 is fastened to the upper surface of the dielectric layer 2. The interconnection 7 is produced from the further main surface 11 of the interposer 1, opposite the dielectric layer 2.

FIG. 3 is a cross section according to FIG. 2 after the formation of the interconnection 7. The further dielectric layer 3 is arranged above the further main surface 11. The interconnection 7 can be produced by etching a via hole through the further dielectric layer 3 and the interposer 1, until a contact area 9 of one of the metal layers 5 is uncovered. A sidewall insulation 8 may be formed in the via hole, and a metallization is applied in the via hole, so that the metallization electrically contacts the contact area 9. The metallization yields the electrically conductive interconnection 7. At least one further metal layer 6, which is connected to the interconnection 7, is arranged in or on the further dielectric layer 3. The inner volume of the interconnection 7 can be filled with the material that is applied to form the further dielectric layer 3, which may be an oxide or nitride of semiconductor material, for instance. A further contact area 19 of the further metal layer 6 can be provided for an external electrical connection. The handling wafer 4 is then removed.

FIG. 4 is a cross section according to FIG. 3 after the placement of chips. Manufacture is facilitated if a further handling wafer 14 is fastened to the further dielectric layer 3. A chip 12 and a further chip 13 are mounted on the dielectric layer 2. Any number of chips can thus be mounted above the main surface 10. Chips and integrated circuits 25 of the interposer 1 may especially be arranged in one-to-one correspondence to form a plurality of device units.

FIG. 5 is a cross section according to FIG. 4 after the application of a planarizing cover layer 16, which may be a polymer, for instance, in particular a photosensitive organic polymer. Openings 17 are formed in the cover layer 16 above contact pads 15 of the chips 12, 13 and above the metal layers 5 in order to allow the contact pads 15 to be electrically connected with one of the metal layers 5 and thus with the interconnection 7. The electrical connection can be formed by an application of a structured metallization 20 as shown in FIG. 1 or by an application of bond wires, which are known per se. After removal of the further handling wafer 14, a bump contact 18 can be applied on the further contact area 19, and the interposer-chip-arrangement according to FIG. 1 is obtained.

FIG. 6 is a cross section according to FIG. 3 after the formation of chip cavities for a further embodiment. Elements corresponding to similar elements of the embodiment according to FIG. 3 are designated with the same reference numerals. After the removal of the handling wafer 4, a further handling wafer 14 may be fastened to the dielectric layer 3. Cavities 22, 23 are formed in the dielectric layer 2 and in the interposer 1. The cavities 22, 23, which are provided for the accommodation of chips, can be produced by etching and may have different depths. It may be suitable to arrange the cavities 22, 23 outside the region occupied by the integrated circuit 25, which is hence not shown in FIG. 6.

FIG. 7 is a cross section according to FIG. 6 after the placement of chips. A chip 12 is arranged in the cavity 22, and a further chip 13 is arranged in the further cavity 23. In the embodiment shown in FIG. 7, the chips 12, 13 have different sizes, and the depths of the cavities 22, 23 are different, so that the contact pads 15 of the chips 12, 13 are at the same level. The cavities 22, 23 can thus be adapted to the sizes of the chips 12, 13. Instead, the cavities 22, 23 can each have the same depth and the same lateral dimensions. The chips 12, 13 can be mounted in the cavities 22, 23 by means of an adhesive, for instance. If the interposer 1 is a semiconductor material, the chips 12, 13 can instead be fastened by a bonding process, which is known per se. If a bonding method is applied, the bottom of the cavity has to be sufficiently plain. This can be achieved by providing an etch stop layer in the interposer 1 at the position where the bottom of a cavity is to be formed.

FIG. 8 is a cross section according to FIG. 7 after the application of a structured metallization 20, which connects areas of the contact pads 15 and the metal layers 5, which are uncovered in the openings 17 of the cover layer 16. After removal of the further handling wafer 14, a bump contact 18 may be applied on the further contact area 19 of the further metal layer 6 according to the embodiment shown in FIG. 1, and the interposer-chip-arrangement can be mounted on a printed circuit board 21.

FIG. 9 is a cross section according to FIG. 6 for a further embodiment comprising cavities for the chips. Elements corresponding to similar elements of the embodiment according to FIG. 6 are designated with the same reference numerals. In the embodiment according to FIG. 9, the cavities 22, 23 are formed in the further dielectric layer 3 and in the further main surface 11 of the interposer 1. The cavities 22, 23 and the integrated circuits 25 are located on opposite sides of the interposer 1. The cavities 22, 23 can be produced by etching like the via hole that is provided for the interconnection 7. The further contact areas 19 of the further metal layer 6 are provided for a connection of the contact pads 15 of the chips 12, 13 with the corresponding interconnections 7.

FIG. 10 is a cross section according to FIG. 9 after the placement of the chip 12 in the cavity 22 and the further chip 13 in the further cavity 23. In the embodiment shown in FIG. 10, the chips 12, 13 have different sizes, and the depths of the cavities 22, 23 are adapted so that the contact pads 15 of the chips 12, 13 are at the same level. The cavities 22, 23 can thus be adapted to the sizes of the chips 12, 13. The cavities 22, 23 can instead each have the same dimensions. The chips 12, 13 can be mounted in the cavities 22, 23 by means of an adhesive, for instance. If the interposer 1 is a semiconductor material, the chips 12, 13 can instead be fastened by a bonding process. A cover layer 16, which may be a polymer, may be applied on the further dielectric layer 3 and on the chip 12. The cover layer 16 is provided with openings 17 above the contact pads 15 and above the further contact areas 19 of the further metal layer 6.

FIG. 11 is a cross section according to FIG. 10 after the application of a structured metallization 20, which connects the contact pads 15 and the further contact areas 19 of the further metal layer 6 in the openings 17 of the cover layer 16. After removal of the handling wafer 4, bump contacts 18 may be applied on the further contact areas 24 of the metal layers 5 according to the embodiment shown in FIG. 8, and the interposer-chip-arrangement can be mounted on a printed circuit board 21.

FIG. 12 is a cross section according to FIG. 11 for a further embodiment comprising chips mounted in flip-chip technology. Elements corresponding to similar elements of the embodiment according to FIG. 11 are designated with the same reference numerals. In the embodiment according to FIG. 12, the interposer-chip-arrangement is provided with bump contacts 18 arranged on the further contact areas 24 above the main surface 10 of the interposer 1. In FIG. 12 the interposer-chip-arrangement is shown after it has been mounted on a printed circuit board 21 using the bump contacts 18. The contact areas 9 above the main surface 10 are connected by interconnections 7 with the further contact areas 19 above the further main surface 11. The further contact areas 19 can be provided with further bump contacts 32, which can be connected with contact pads of a further interposer or printed circuit board, for example.

Above the further main surface 11, a chip 26 is arranged with its contact pads 15 connected to further contact areas 19 of the interposer 1 in order to connect the contact pads 15 electrically conductively with interconnections 7 of the interposer 1. The connections between the contact pads 15 and the corresponding further contact areas 19 can be provided by bump contacts 31 in flip-chip-technology. Above the main surface 10, further chips 27, 28 can be arranged with their contact pads 15 connected to further contact areas 24 of the interposer 1. These connections can also be provided by bump contacts 30 in flip-chip-technology. The further chips 27, 28 are thus arranged between the interposer 1 and the printed circuit board 21. There may be any number of chips 26, 27, 28 mounted in this way by means of bump contacts 30, 31.

An interconnection 7 can serve to connect bump contacts 18 and further bump contacts 32 of the interposer-chip-arrangement in order to provide an electrical connection through the interposer 1. An interconnection 7 can instead or additionally serve to connect a contact pad 15 of one of the mounted chips 12, 13, 26, 27, 28 with any further contact pad 15 of any of the mounted chips 12, 13, 26, 27, 28.

The described interposer-chip-arrangement allows a reduction of the lateral and vertical dimensions of the chip package. Extremely flat and small wafer level packages are obtained by means of interconnections formed like through-substrate vias connecting redistribution metal layers on opposite sides of the interposer. The integrated circuit of the interposer yields an especially dense arrangement of the circuitry, additionally to the circuit components that are provided by the mounted chips. 

We claim:
 1. A method of producing an interposer-chip-arrangement, comprising: providing an interposer with an integrated circuit; arranging a dielectric layer with metal layers embedded in the dielectric layer above a main surface of the interposer; connecting the integrated circuit with at least one of the metal layers; forming an interconnection through the interposer, the interconnection contacting one of the metal layers; arranging a further dielectric layer above a further main surface of the interposer opposite the main surface and arranging a further metal layer in or on the further dielectric layer, the further metal layer being connected with the interconnection; arranging a chip provided with at least one contact pad at the main surface or at the further main surface; and electrically conductively connecting the contact pad with the interconnection.
 2. The method of claim 1, further comprising: applying a structured metallization connecting the contact pad with the interconnection.
 3. The method of claim 1, wherein the contact pad is connected with the interconnection via one of the metal layers.
 4. The method of claim 1, wherein the contact pad is connected with the interconnection via the further metal layer.
 5. The method of claim 1, further comprising: forming a cavity in the interposer and arranging the chip in the cavity.
 6. The method of claim 5, further comprising: forming a further cavity in the interposer and arranging a further chip provided with at least one contact pad in the further cavity, so that the contact pads of the chips are at the same level.
 7. The method of claim 1, wherein the interconnection is formed in the shape of a hollow cylinder and is filled with dielectric material.
 8. A method of producing an interposer-chip-arrangement, comprising: providing an interposer with an integrated circuit; arranging a dielectric layer with metal layers embedded in the dielectric layer above a main surface of the interposer; connecting the integrated circuit with at least one of the metal layers; forming interconnections through the interposer, the interconnections each contacting one of the metal layers; arranging a further dielectric layer above a further main surface of the interposer opposite the main surface and arranging further metal layers in or on the further dielectric layer, the further metal layers being each connected with one of the interconnections; forming a cavity in the interposer at the main surface or at the further main surface; arranging a chip provided with at least one contact pad in the cavity; forming a further cavity in the interposer and arranging a further chip provided with at least one contact pad in the further cavity, so that the contact pads of the chips are at the same level; and applying a structured metallization electrically conductively connecting the contact pads with the interconnections. 